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Si-CheckIR IISi-CheckIR is ATR accessory of FTIR for surface analysis of coating, thin film and organic pollution on silicon wafer, film, crystal and glass.
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Si-CheckIR can analyze the surface of such as a silicon wafer or glass by the multiplex reflection ATR measurement.
This accessory has Germanium crystal which is a high refractive index. Then make it possible to measure the surface of samples.
Two type of sample press heads including this accessory for various size of sample. Large sample press head is use for measurement large size sample size such as 6inh wafer. The small sample press head for about 10 to 20mm circle and square sample.
ATR method is the effective technique that easy to measure the hydrogen termination and oxidation state of silicon surface after washing by HF under ordinary pressure.
One of the key things what to measure the surface by ATR is contact the sample and ATR crystal.
Especially measuring the surface of silicon such as hard material is not easy to contact the sample and multi reflection ATR crystal.
Result of conventional multi reflection ATR accessory is poorly-reproducible for quantitative measurement.Si-CheckIR easily produces a good result by unique pressurization press mechanism and special crystal which developed equipment for this measurement.
Therefore it gets result of high reproductibility for surface measurement of a hard material such as silicon wafer.In addition, multi reflection ATR is enhance sensitivity and can get the high peak intensity.
Si-CheckIR used special germanium crystal and uniquely optical design for high thru-put energy to get good signal to noise of spectrum.
The 12inch Si-CheckIR can measure the large sample such as 12inch silicon wafer.
It is very easy to measure the large sample without cutting the sample.
Si-CheckIR and 12 inch Si-CheckIR can install most type of FT-IR
This accessory has Germanium crystal which is a high refractive index. Then make it possible to measure the surface of samples.
Two type of sample press heads including this accessory for various size of sample. Large sample press head is use for measurement large size sample size such as 6inh wafer. The small sample press head for about 10 to 20mm circle and square sample.
ATR method is the effective technique that easy to measure the hydrogen termination and oxidation state of silicon surface after washing by HF under ordinary pressure.
One of the key things what to measure the surface by ATR is contact the sample and ATR crystal.
Especially measuring the surface of silicon such as hard material is not easy to contact the sample and multi reflection ATR crystal.
Result of conventional multi reflection ATR accessory is poorly-reproducible for quantitative measurement.Si-CheckIR easily produces a good result by unique pressurization press mechanism and special crystal which developed equipment for this measurement.
Therefore it gets result of high reproductibility for surface measurement of a hard material such as silicon wafer.In addition, multi reflection ATR is enhance sensitivity and can get the high peak intensity.
Si-CheckIR used special germanium crystal and uniquely optical design for high thru-put energy to get good signal to noise of spectrum.
The 12inch Si-CheckIR can measure the large sample such as 12inch silicon wafer.
It is very easy to measure the large sample without cutting the sample.
Si-CheckIR and 12 inch Si-CheckIR can install most type of FT-IR
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Feature：
・Unique pressurization press is provide the pressure of uniformity and constant to whole area of sample for high reproducible measurement. ・Sample stage is easy to put the large sample and to keep even up the sample. ・To realize the accurate angle of ATR method, Si-CheckIR is designed the incident angle is 60deg +/-1.5deg ・Easy to clean the crystal surface by function of swing of Pressure device. ・Durable body for measurement of high reproducibility. - 2 type of press heads are able to measure the large sample to small sample. |
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